Ar+-Induced Surface Defects on HOPG and Their Effect on the Nucleation, Coalescence and Growth of Evaporated Copper

D.-Q. Yang and Edward Sacher

Article (2002)

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Department:	Department of Engineering Physics
Research Center:	GCM - Thin Film Physics and Technology Research Group
PolyPublie URL:	https://publications.polymtl.ca/26187/
Journal Title:	Surface Science (vol. 516, no. 1-2)
Publisher:	Elsevier
DOI:	10.1016/s0039-6028(02)02065-4
Official URL:	https://doi.org/10.1016/s0039-6028%2802%2902065-4
Date Deposited:	18 Apr 2023 15:21
Last Modified:	25 Sep 2024 16:06

Cite in APA 7:	Yang, D.-Q., & Sacher, E. (2002). Ar+-Induced Surface Defects on HOPG and Their Effect on the Nucleation, Coalescence and Growth of Evaporated Copper. Surface Science, 516(1-2), 43-55. https://doi.org/10.1016/s0039-6028%2802%2902065-4
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