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Ar+-Induced Surface Defects on HOPG and Their Effect on the Nucleation, Coalescence and Growth of Evaporated Copper

D.-Q. Yang and Edward Sacher

Article (2002)

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Department: Department of Engineering Physics
Research Center: GCM - Thin Film Physics and Technology Research Group
PolyPublie URL: https://publications.polymtl.ca/26187/
Journal Title: Surface Science (vol. 516, no. 1-2)
Publisher: Elsevier
DOI: 10.1016/s0039-6028(02)02065-4
Official URL: https://doi.org/10.1016/s0039-6028%2802%2902065-4
Date Deposited: 18 Apr 2023 15:21
Last Modified: 05 Apr 2024 11:13
Cite in APA 7: Yang, D.-Q., & Sacher, E. (2002). Ar+-Induced Surface Defects on HOPG and Their Effect on the Nucleation, Coalescence and Growth of Evaporated Copper. Surface Science, 516(1-2), 43-55. https://doi.org/10.1016/s0039-6028%2802%2902065-4

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