P. Cova, Suzie Poulin and Rémo A. Masut
Article (2005)
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| Department: | Department of Engineering Physics |
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| PolyPublie URL: | https://publications.polymtl.ca/24246/ |
| Journal Title: | Journal of Applied Physics (vol. 98, no. 9) |
| Publisher: | American Institute of Physics |
| DOI: | 10.1063/1.2113415 |
| Official URL: | https://doi.org/10.1063/1.2113415 |
| Date Deposited: | 18 Apr 2023 15:18 |
| Last Modified: | 25 Sep 2024 16:03 |
| Cite in APA 7: | Cova, P., Poulin, S., & Masut, R. A. (2005). X-Ray Photoelectron Spectroscopy and Structural Analysis of Amorphous Si OₓNy Films Deposited at Low Temperatures. Journal of Applied Physics, 98(9). https://doi.org/10.1063/1.2113415 |
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