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X-Ray Photoelectron Spectroscopy and Structural Analysis of Amorphous Si OₓNy Films Deposited at Low Temperatures

P. Cova, Suzie Poulin and Rémo A. Masut

Article (2005)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/24246/
Journal Title: Journal of Applied Physics (vol. 98, no. 9)
Publisher: American Institute of Physics
DOI: 10.1063/1.2113415
Official URL: https://doi.org/10.1063/1.2113415
Date Deposited: 18 Apr 2023 15:18
Last Modified: 05 Apr 2024 11:09
Cite in APA 7: Cova, P., Poulin, S., & Masut, R. A. (2005). X-Ray Photoelectron Spectroscopy and Structural Analysis of Amorphous Si OₓNy Films Deposited at Low Temperatures. Journal of Applied Physics, 98(9). https://doi.org/10.1063/1.2113415

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