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Atom-by-atom simulations of chemical vapor deposition of nanoporous hydrogenated silicon nitride

J. Houska, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2010)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/18162/
Journal Title: Journal of Applied Physics (vol. 107, no. 8)
Publisher: American Institute of Physics
DOI: 10.1063/1.3371680
Official URL: https://doi.org/10.1063/1.3371680
Date Deposited: 18 Apr 2023 15:13
Last Modified: 05 Apr 2024 11:00
Cite in APA 7: Houska, J., Sapieha, J.-E., & Martinu, L. (2010). Atom-by-atom simulations of chemical vapor deposition of nanoporous hydrogenated silicon nitride. Journal of Applied Physics, 107(8), 083501-083501. https://doi.org/10.1063/1.3371680

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