Documents publiés en "2010"

Communication écrite

Bettayeb, B., Vialletelle, P., Bassetto, S., & Tollenaere, M. (octobre 2010). Optimized design of control plans based on risk exposure and resources capabilities [Communication écrite]. International Symposium on Semiconductor Manufacturing (ISSM 2010), Tokyo. Japan. Lien externe

Bettayeb, B., Vialletelle, P., Bassetto, S., & Tollenaere, M. (novembre 2010). Operational risk evaluation and control plan design [Communication écrite]. 13th ARCSIS Technical & Scientific Meeting, Manufacturing Challenges in European Semiconductor Fabs, Rousset, France. Non disponible