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Zhang, Z., Yang, B., Zhu, Y., Gaudet, S., Rossnagel, S., Kellock, A. J., Ozcan, A., Murray, C., Desjardins, P., Zhang, S.-L., Jordan-Sweet, J., & Lavoie, C. (2010). Exploitation of a self-limiting process for reproducible formation of ultrathin Ni1-xPtx silicide films. Applied Physics Letters, 97(25), 252108-252108. Lien externe
