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Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Bielinski, D. M., Sapieha, J.-E., Nakanishi, Y., Aoki, T., & Hatanaka, Y. (2003). Remote Hydrogen Plasma Chemical Vapor Deposition From (Dimethylsilyl)(Trimethylsilyl)Methane. 2. Property-Structure Relationships for Resulting Silicon-Carbon Films. Chemistry of Materials, 15(8), 1757-1762. Lien externe
Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Sapieha, J.-E., Nakanishi, Y., Aoki, T., & Hatanaka, Y. (2003). Remote Hydrogen Plasma Chemical Vapor Deposition From (Dimethylsilyl)(Trimethylsilyl)Methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon-Carbon Films. Chemistry of Materials, 15(8), 1749-1756. Lien externe
