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Remote Hydrogen Plasma Chemical Vapor Deposition From (Dimethylsilyl)(Trimethylsilyl)Methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon-Carbon Films

A. M. Wróbel, A. Walkiewicz-Pietrzykowska, Jolanta-Ewa Sapieha, Y. Nakanishi, T. Aoki and Y. Hatanaka

Article (2003)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/25409/
Journal Title: Chemistry of Materials (vol. 15, no. 8)
Publisher: American Chemical Society (ACS)
DOI: 10.1021/cm021250c
Official URL: https://doi.org/10.1021/cm021250c
Date Deposited: 18 Apr 2023 15:20
Last Modified: 05 Apr 2024 11:11
Cite in APA 7: Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Sapieha, J.-E., Nakanishi, Y., Aoki, T., & Hatanaka, Y. (2003). Remote Hydrogen Plasma Chemical Vapor Deposition From (Dimethylsilyl)(Trimethylsilyl)Methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon-Carbon Films. Chemistry of Materials, 15(8), 1749-1756. https://doi.org/10.1021/cm021250c

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