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Mackova, A., Perina, V., Hnatowicz, V., Supiot, P., Vivien, C., Bousquet, A., Granier, A., Boufayed, F., Escaich, D., Raynaud, P., Segui, Y., Dennler, G., Wertheimer, M. R., Stryhal, Z., & Pavlik, J. (juin 2003). Compared properties of Organosilicon films induced by RF and Microwave organosilicon/O₂ plasmas and afterglows [Communication écrite]. 16th International Symposium on Plasma Chemistry (ISPC 2003), Taormina, Italy (5 pages). Lien externe
