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Rubinshtein, A., Shneck, R., Raveh, A., Sapieha, J.-E., & Martinu, L. (2000). Carburizing of Tantalum by Radio-Frequency Plasma Assisted Chemical Vapor Deposition. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 18(4), 2017-2022. Lien externe
