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Leclerc, S., Lecours, A., Caron, M., Richard, E., Turcotte, G., & Currie, J. F. (1998). Electron Cyclotron Resonance Plasma Chemical Vapor Deposited Silicon Nitride for Micromechanical Applications. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 16(2), 881-884. Lien externe
