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Electron Cyclotron Resonance Plasma Chemical Vapor Deposited Silicon Nitride for Micromechanical Applications

S. Leclerc, A. Lecours, M. Caron, E. Richard, G. Turcotte and John F. Currie

Article (1998)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/29528/
Journal Title: Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 16, no. 2)
Publisher: American Vacuum Society
DOI: 10.1116/1.581028
Official URL: https://doi.org/10.1116/1.581028
Date Deposited: 18 Apr 2023 15:23
Last Modified: 05 Apr 2024 11:18
Cite in APA 7: Leclerc, S., Lecours, A., Caron, M., Richard, E., Turcotte, G., & Currie, J. F. (1998). Electron Cyclotron Resonance Plasma Chemical Vapor Deposited Silicon Nitride for Micromechanical Applications. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 16(2), 881-884. https://doi.org/10.1116/1.581028

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