S. Leclerc, A. Lecours, M. Caron, E. Richard, G. Turcotte and John F. Currie
Article (1998)
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| Additional Information: | Nom historique du département: Département de génie physique et de génie des matériaux |
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| Department: | Department of Engineering Physics |
| PolyPublie URL: | https://publications.polymtl.ca/29528/ |
| Journal Title: | Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 16, no. 2) |
| Publisher: | American Vacuum Society |
| DOI: | 10.1116/1.581028 |
| Official URL: | https://doi.org/10.1116/1.581028 |
| Date Deposited: | 18 Apr 2023 15:23 |
| Last Modified: | 25 Sep 2024 16:11 |
| Cite in APA 7: | Leclerc, S., Lecours, A., Caron, M., Richard, E., Turcotte, G., & Currie, J. F. (1998). Electron Cyclotron Resonance Plasma Chemical Vapor Deposited Silicon Nitride for Micromechanical Applications. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 16(2), 881-884. https://doi.org/10.1116/1.581028 |
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