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Martinu, L., Sapieha, J.-E., Kuttel, O. M., Raveh, A., & Wertheimer, M. R. (novembre 1993). Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor deposition [Communication écrite]. 40th National Symposium of the American Vacuum Society, Orlando, FL. Publié dans Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 12(4, pt. 1). Lien externe
