Documents dont l'auteur est "Rossnagel, S. M."

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Zhang, Z., Zhang, S.-L., Yang, B., Zhu, Y., Rossnagel, S. M., Gaudet, S., Kellock, A. J., Jordan-Sweet, J., & Lavoie, C. (2010). Morphological stability and specific resistivity of sub-10 nm silicide films of Ni1-xPtx on Si substrate. Applied Physics Letters, 96(7), 071915-071915. Lien externe