Documents dont l'auteur est "Hatanaka, Y."

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Nombre de documents: 2

Wróbel, A. M., Blaszczyk, I., Walkiewicz-Pietrzykowska, A., Tracz, A., Sapieha, J.-E., Aoki, T., & Hatanaka, Y. (2003). Remote Hydrogen-Nitrogen Plasma Chemical Vapor Deposition From a Tetramethyldisilazane Source. Part 1. Mechanism of the Process, Structure and Surface Morphology of Deposited Amorphous Hydrogenated Silicon Carbonitride Films. Journal of Materials Chemistry, 13(4), 731-737. Lien externe

Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Sapieha, J.-E., Hatanaka, Y., Aoki, T., & Nakanishi, Y. (2002). Remote Hydrogen Plasma Chemical Vapor Deposition of Silicon- Carbon Thin-Film Materials From a Hexamethyldisilane Source: Characterization of the Process and the Deposits. Journal of Applied Polymer Science, 86(6), 1445-1458. Lien externe

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