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Ion bombardment effects in low-pressure plasmas : in situ spectroscopic ellipsometry and Monte-Carlo simulation study

Aram Amassian

PhD thesis (2005)

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Cite this document: Amassian, A. (2005). Ion bombardment effects in low-pressure plasmas : in situ spectroscopic ellipsometry and Monte-Carlo simulation study (PhD thesis, École Polytechnique de Montréal). Retrieved from https://publications.polymtl.ca/7544/
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Abstract

Ion-surface interactions -- Experimental methodology and simulation tools -- Ion-surface interactions on c-si (001) at the radiofrequency -powered electrode in low-pressure plasmas : ex-situ spectroscopic ellipsometry and Monte-Carlo simulation study -- Dynamics of ion bombardment-induced modifications of i(001) at the radiofrequency-biased electrode in low-pressure oxygen plasmas : in situ spectroscopic ellipsometry and Monte-Carlo study -- Interface broadening due to mixing during thin film growth at the radiofrequency-powered electrode in a plasma-enhanced chemical vapor deposition environment -- Interface engineering during plasma-enhanced chemical vapor deposition of porous/dense SiN3 optical multilayers.

Uncontrolled Keywords

Plasma (Gaz ionisés); Bombardement ionique; Ellipsométrie; Spectroscopie atomique; Méthode de Monte-Carlo

Open Access document in PolyPublie
Additional Information: Le fichier PDF de ce document a été produit par Bibliothèque et Archives Canada selon les termes du programme Thèses Canada https://canada.on.worldcat.org/oclc/182040088
Department: Département de génie physique
Date Deposited: 04 Aug 2021 11:05
Last Modified: 25 Aug 2021 14:58
PolyPublie URL: https://publications.polymtl.ca/7544/

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