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Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition

Alessio Aufoujal, Ulrich Legrand, Jean-Luc Meunier and Jason Robert Tavares

Article (2020)

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Department: Department of Chemical Engineering
PolyPublie URL: https://publications.polymtl.ca/45975/
Journal Title: Catalysts (vol. 10, no. 5)
Publisher: MDPI
DOI: 10.3390/catal10050534
Official URL: https://doi.org/10.3390/catal10050534
Date Deposited: 18 Apr 2023 15:00
Last Modified: 25 Sep 2024 16:34
Cite in APA 7: Aufoujal, A., Legrand, U., Meunier, J.-L., & Tavares, J. R. (2020). Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition. Catalysts, 10(5), 534 (17 pages). https://doi.org/10.3390/catal10050534

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