Alessio Aufoujal, Ulrich Legrand, Jean-Luc Meunier and Jason Robert Tavares
Article (2020)
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| Department: | Department of Chemical Engineering |
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| Research Center: | CREPEC - Center for Applied Research on Polymers and Composites |
| PolyPublie URL: | https://publications.polymtl.ca/45975/ |
| Journal Title: | Catalysts (vol. 10, no. 5) |
| Publisher: | MDPI |
| DOI: | 10.3390/catal10050534 |
| Official URL: | https://doi.org/10.3390/catal10050534 |
| Date Deposited: | 18 Apr 2023 15:00 |
| Last Modified: | 25 Apr 2025 15:41 |
| Cite in APA 7: | Aufoujal, A., Legrand, U., Meunier, J.-L., & Tavares, J. R. (2020). Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition. Catalysts, 10(5), 534 (17 pages). https://doi.org/10.3390/catal10050534 |
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