Article (2018)
An external link is available for this item| Department: | Department of Engineering Physics |
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| Research Center: | RQMP - Regroupement québécois sur les matériaux de pointe |
| PolyPublie URL: | https://publications.polymtl.ca/41323/ |
| Journal Title: | Journal of Applied Physics (vol. 124, no. 9) |
| Publisher: | AIP Publishing |
| DOI: | 10.1063/1.5031106 |
| Official URL: | https://doi.org/10.1063/1.5031106 |
| Date Deposited: | 18 Apr 2023 15:03 |
| Last Modified: | 27 Sep 2024 09:41 |
| Cite in APA 7: | Masut, R. A. (2018). Incorporation of Si during vapor phase epitaxy of III-V compounds: evidence of an enthalpy-entropy compensation effect. Journal of Applied Physics, 124(9), 7 pages. https://doi.org/10.1063/1.5031106 |
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