Strain-driven diffusion process during silicon oxidation investigated by coupling density functional theory and activation relaxation technique

Nicholas Salles, Nicholas Richard, Normand Mousseau and Anne Hemeryck

Article (2017)

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Department:	Department of Mathematics and Industrial Engineering
PolyPublie URL:	https://publications.polymtl.ca/41322/
Journal Title:	Journal of Chemical Physics (vol. 147, no. 5)
Publisher:	American Institute of Physics
DOI:	10.1063/1.4996206
Official URL:	https://doi.org/10.1063/1.4996206
Date Deposited:	18 Apr 2023 15:04
Last Modified:	05 Apr 2024 11:38

Cite in APA 7:	Salles, N., Richard, N., Mousseau, N., & Hemeryck, A. (2017). Strain-driven diffusion process during silicon oxidation investigated by coupling density functional theory and activation relaxation technique. Journal of Chemical Physics, 147(5), 054701 (9 pages). https://doi.org/10.1063/1.4996206
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