Yves Tessier, Jolanta-Ewa Sapieha
, S. Poulin-Dandurand and Michael R. Wertheimer
Article (2011)
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| Department: | Department of Engineering Physics |
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| Research Center: | GCM - Thin Film Physics and Technology Research Group |
| PolyPublie URL: | https://publications.polymtl.ca/38234/ |
| Journal Title: | MRS Proceedings (vol. 68) |
| Publisher: | Cambridge University Press |
| DOI: | 10.1557/proc-68-183 |
| Official URL: | https://doi.org/10.1557/proc-68-183 |
| Date Deposited: | 18 Apr 2023 15:12 |
| Last Modified: | 25 Sep 2024 16:22 |
| Cite in APA 7: | Tessier, Y., Sapieha, J.-E., Poulin-Dandurand, S., & Wertheimer, M. R. (2011). Silicon Nitride from Microwave Plasma: Fabrication and Characterization. MRS Proceedings, 68. https://doi.org/10.1557/proc-68-183 |
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