S. Sapieha, A. M. Wróbel and Michael R. Wertheimer
Article (1988)
An external link is available for this item| Department: | Department of Engineering Physics |
|---|---|
| PolyPublie URL: | https://publications.polymtl.ca/38225/ |
| Journal Title: | Plasma Chemistry and Plasma Processing (vol. 8, no. 3) |
| Publisher: | Springer |
| DOI: | 10.1007/bf01020410 |
| Official URL: | https://doi.org/10.1007/bf01020410 |
| Date Deposited: | 18 Apr 2023 15:26 |
| Last Modified: | 08 Apr 2025 07:01 |
| Cite in APA 7: | Sapieha, S., Wróbel, A. M., & Wertheimer, M. R. (1988). Plasma-assisted etching of paper. Plasma Chemistry and Plasma Processing, 8(3), 331-346. https://doi.org/10.1007/bf01020410 |
|---|---|
Statistics
Dimensions
