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Electron beam lithography using a PMMA/P(MMA 8.5 MAA) bilayer for negative tone lift-off process

A. P. Blanchard-Dionne and Michel Meunier

Article (2015)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/34397/
Journal Title: Journal of Vacuum Science & Technology B: Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena (vol. 33, no. 6)
Publisher: American Vacuum Society
DOI: 10.1116/1.4935129
Official URL: https://doi.org/10.1116/1.4935129
Date Deposited: 18 Apr 2023 15:06
Last Modified: 05 Apr 2024 11:26
Cite in APA 7: Blanchard-Dionne, A. P., & Meunier, M. (2015). Electron beam lithography using a PMMA/P(MMA 8.5 MAA) bilayer for negative tone lift-off process. Journal of Vacuum Science & Technology B: Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 33(6), 061602 (5 pages). https://doi.org/10.1116/1.4935129

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