In situ micro Raman investigation of the laser crystallization in Si thin films plasma enhanced chemical vapor deposition-grown from He-diluted SiH4

Clara Santato, Giorgio Mattei, Wu Ruihua and Federico Mecarini

Article (2004)

Document published while its authors were not affiliated with Polytechnique Montréal

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PolyPublie URL:	https://publications.polymtl.ca/33679/
Journal Title:	Journal of Applied Physics (vol. 95, no. 10)
Publisher:	American Institute of Physics
DOI:	10.1063/1.1699506
Official URL:	https://doi.org/10.1063/1.1699506
Date Deposited:	18 Apr 2023 15:19
Last Modified:	08 Apr 2025 06:54

Cite in APA 7:	Santato, C., Mattei, G., Ruihua, W., & Mecarini, F. (2004). In situ micro Raman investigation of the laser crystallization in Si thin films plasma enhanced chemical vapor deposition-grown from He-diluted SiH4. Journal of Applied Physics, 95(10), 5366-5372. https://doi.org/10.1063/1.1699506
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