A. S. da Silva Sobrinho, J. Chasle, G. Dennler and Michael R. Wertheimer
Article (1998)
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| Additional Information: | Nom historique du département: Département de génie physique et de génie des matériaux |
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| Department: | Department of Engineering Physics |
| Research Center: | GCM - Thin Film Physics and Technology Research Group |
| PolyPublie URL: | https://publications.polymtl.ca/29747/ |
| Journal Title: | Plasmas and Polymers (vol. 3, no. 4) |
| Publisher: | Kluwer Academic Publishers |
| DOI: | 10.1023/a:1021854805605 |
| Official URL: | https://doi.org/10.1023/a%3a1021854805605 |
| Date Deposited: | 18 Apr 2023 15:23 |
| Last Modified: | 08 Apr 2025 02:20 |
| Cite in APA 7: | da Silva Sobrinho, A. S., Chasle, J., Dennler, G., & Wertheimer, M. R. (1998). Characterization of defects in PECVD-SiO₂ coatings on PET by confocal microscopy. Plasmas and Polymers, 3(4), 231-247. https://doi.org/10.1023/a%3a1021854805605 |
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