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Bistable Microelectrothermal Actuator in a Standard Complementary Metal-Oxide-Semiconductor Process

I. C. Ressejac, L. M. Landsberger and John F. Currie

Article (2000)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/27886/
Journal Title: Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 18, no. 2)
Publisher: American Vacuum Society
DOI: 10.1116/1.582171
Official URL: https://doi.org/10.1116/1.582171
Date Deposited: 18 Apr 2023 15:22
Last Modified: 05 Apr 2024 11:15
Cite in APA 7: Ressejac, I. C., Landsberger, L. M., & Currie, J. F. (2000). Bistable Microelectrothermal Actuator in a Standard Complementary Metal-Oxide-Semiconductor Process. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 18(2), 746-749. https://doi.org/10.1116/1.582171

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