I. C. Ressejac, L. M. Landsberger and John F. Currie
Article (2000)
An external link is available for this item| Additional Information: | Nom historique du département: Département de génie physique et de génie des matériaux |
|---|---|
| Department: | Department of Engineering Physics |
| Research Center: | GCM - Thin Film Physics and Technology Research Group |
| PolyPublie URL: | https://publications.polymtl.ca/27886/ |
| Journal Title: | Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 18, no. 2) |
| Publisher: | American Vacuum Society |
| DOI: | 10.1116/1.582171 |
| Official URL: | https://doi.org/10.1116/1.582171 |
| Date Deposited: | 18 Apr 2023 15:22 |
| Last Modified: | 08 Apr 2025 02:17 |
| Cite in APA 7: | Ressejac, I. C., Landsberger, L. M., & Currie, J. F. (2000). Bistable Microelectrothermal Actuator in a Standard Complementary Metal-Oxide-Semiconductor Process. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 18(2), 746-749. https://doi.org/10.1116/1.582171 |
|---|---|
Statistics
Dimensions
