Bistable Microelectrothermal Actuator in a Standard Complementary Metal-Oxide-Semiconductor Process

I. C. Ressejac, L. M. Landsberger and John F. Currie

Article (2000)

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Additional Information:	Nom historique du département: Département de génie physique et de génie des matériaux
Department:	Department of Engineering Physics
Research Center:	GCM - Thin Film Physics and Technology Research Group
PolyPublie URL:	https://publications.polymtl.ca/27886/
Journal Title:	Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 18, no. 2)
Publisher:	American Vacuum Society
DOI:	10.1116/1.582171
Official URL:	https://doi.org/10.1116/1.582171
Date Deposited:	18 Apr 2023 15:22
Last Modified:	25 Sep 2024 16:08

Cite in APA 7:	Ressejac, I. C., Landsberger, L. M., & Currie, J. F. (2000). Bistable Microelectrothermal Actuator in a Standard Complementary Metal-Oxide-Semiconductor Process. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 18(2), 746-749. https://doi.org/10.1116/1.582171
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