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Sulfur-rich organic films deposited by plasma- and vacuum-ultraviolet (VUV) photo-polymerization

Evelyne Kasparek, Jason Robert Tavares, Michael R. Wertheimer and Pierre-Luc Girard-Lauriault

Article (2016)

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Cite this document: Kasparek, E., Tavares, J. R., Wertheimer, M. R. & Girard-Lauriault, P.-L. (2016). Sulfur-rich organic films deposited by plasma- and vacuum-ultraviolet (VUV) photo-polymerization. Plasma Processes and Polymers, 13(9), p. 888-899. doi:10.1002/ppap.201500200
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Abstract

Thiol (SH)-terminated surfaces have been progressively gaining interest over the past years as a consequence of their widespread potential applications. Here, SH-terminated thin films have been prepared by “co-polymerizing” gas mixtures comprising ethylene (C2H4) or butadiene (C4H6) with hydrogen sulfide (H2S). This has been accomplished by either vacuum-ultraviolet (VUV) irradiation of the flowing gas mixtures with near-monochromatic radiation from a Kr lamp, or by low-pressure r.f. plasma-enhanced chemical vapor deposition (PECVD). Varying the gas mixture ratio, R, allows one to control the films’ sulfur content as well as the thiol concentration [[BOND]SH]. The deposits were characterized by X-ray photoelectron spectroscopy (XPS), before and after chemical derivatization with N-ethylmaleimide, and by ATR FTIR. VUV- and plasma-prepared coatings were found to possess very similar structures and characteristics, showing chemically bonded sulfur concentrations, [S], up to 48 at% and [[BOND]SH] up to 3%. All coatings remained essentially unchanged in thickness after immersion in water for 24 h.

Uncontrolled Keywords

plasma polymerization; sulfur-rich organic films; thiol derivatization; vacuum ultraviolet photo-polymerization

Open Access document in PolyPublie
Subjects: 1800 Génie chimique > 1800 Génie chimique
2000 Science et technologie des matériaux > 2004 Polymères et revêtements
2000 Science et technologie des matériaux > 2010 Films minces et interfaces
Department: Département de génie chimique
Research Center: GCM - Groupe de recherche en physique et technologie des couches minces
Funders: CRSNG/NSERC
Grant number: RGPIN 418847-2013
Date Deposited: 03 Oct 2017 14:43
Last Modified: 24 Oct 2018 16:12
PolyPublie URL: https://publications.polymtl.ca/2786/
Document issued by the official publisher
Journal Title: Plasma Processes and Polymers (vol. 13, no. 9)
Publisher: Wiley
Official URL: https://doi.org/10.1002/ppap.201500200

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