Evelyne Kasparek, Jason Robert Tavares, Michael R. Wertheimer
et Pierre-Luc Girard-Lauriault
Article de revue (2016)
![]() |
Libre accès au plein texte de ce document Version finale avant publication Conditions d'utilisation: Tous droits réservés Télécharger (1MB) |
Abstract
Thiol (SH)-terminated surfaces have been progressively gaining interest over the past years as a consequence of their widespread potential applications. Here, SH-terminated thin films have been prepared by “co-polymerizing” gas mixtures comprising ethylene (C2H4) or butadiene (C4H6) with hydrogen sulfide (H2S). This has been accomplished by either vacuum-ultraviolet (VUV) irradiation of the flowing gas mixtures with near-monochromatic radiation from a Kr lamp, or by low-pressure r.f. plasma-enhanced chemical vapor deposition (PECVD). Varying the gas mixture ratio, R, allows one to control the films' sulfur content as well as the thiol concentration [[BOND]SH]. The deposits were characterized by X-ray photoelectron spectroscopy (XPS), before and after chemical derivatization with N-ethylmaleimide, and by ATR FTIR. VUV- and plasma-prepared coatings were found to possess very similar structures and characteristics, showing chemically bonded sulfur concentrations, [S], up to 48 at% and [[BOND]SH] up to 3%. All coatings remained essentially unchanged in thickness after immersion in water for 24 h.
Mots clés
plasma polymerization; sulfur-rich organic films; thiol derivatization; vacuum ultraviolet photo-polymerization
Sujet(s): |
1800 Génie chimique > 1800 Génie chimique 2000 Science et technologie des matériaux > 2004 Polymères et revêtements 2000 Science et technologie des matériaux > 2010 Films minces et interfaces |
---|---|
Département: | Département de génie chimique |
Centre de recherche: | GCM - Groupe de recherche en physique et technologie des couches minces |
Organismes subventionnaires: | CRSNG/NSERC |
Numéro de subvention: | RGPIN 418847-2013 |
URL de PolyPublie: | https://publications.polymtl.ca/2786/ |
Titre de la revue: | Plasma Processes and Polymers (vol. 13, no 9) |
Maison d'édition: | Wiley |
DOI: | 10.1002/ppap.201500200 |
URL officielle: | https://doi.org/10.1002/ppap.201500200 |
Date du dépôt: | 03 oct. 2017 14:43 |
Dernière modification: | 11 avr. 2024 05:58 |
Citer en APA 7: | Kasparek, E., Tavares, J. R., Wertheimer, M. R., & Girard-Lauriault, P.-L. (2016). Sulfur-rich organic films deposited by plasma- and vacuum-ultraviolet (VUV) photo-polymerization. Plasma Processes and Polymers, 13(9), 888-899. https://doi.org/10.1002/ppap.201500200 |
---|---|
Statistiques
Total des téléchargements à partir de PolyPublie
Téléchargements par année
Provenance des téléchargements
Dimensions