X. Wu, Edward Sacher and Michel Meunier
Article (2000)
An external link is available for this item| Additional Information: | Nom historique du département: Département de génie physique et de génie des matériaux |
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| Department: | Department of Engineering Physics |
| Research Center: | GCM - Thin Film Physics and Technology Research Group |
| PolyPublie URL: | https://publications.polymtl.ca/27744/ |
| Journal Title: | Journal of Applied Physics (vol. 87, no. 8) |
| Publisher: | American Institute of Physics |
| DOI: | 10.1063/1.372391 |
| Official URL: | https://doi.org/10.1063/1.372391 |
| Date Deposited: | 18 Apr 2023 15:22 |
| Last Modified: | 08 Apr 2025 02:17 |
| Cite in APA 7: | Wu, X., Sacher, E., & Meunier, M. (2000). The Modeling of Excimer Laser Particle Removal From Hydrophilic Silicon Surfaces. Journal of Applied Physics, 87(8), 3618-3627. https://doi.org/10.1063/1.372391 |
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