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Studies of the Earliest Stages of Plasma-Enhanced Chemical Vapor Deposition of Sio2 on Polymeric Substrates

G. Dennler, A. Houdayer, M. Latrèche, Y. Segui and Michael R. Wertheimer

Article (2001)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/27461/
Journal Title: Thin Solid Films (vol. 382, no. 1-2)
Publisher: Elsevier
DOI: 10.1016/s0040-6090(00)01781-8
Official URL: https://doi.org/10.1016/s0040-6090%2800%2901781-8
Date Deposited: 18 Apr 2023 15:21
Last Modified: 22 May 2024 14:01
Cite in APA 7: Dennler, G., Houdayer, A., Latrèche, M., Segui, Y., & Wertheimer, M. R. (2001). Studies of the Earliest Stages of Plasma-Enhanced Chemical Vapor Deposition of Sio2 on Polymeric Substrates. Thin Solid Films, 382(1-2), 1-3. https://doi.org/10.1016/s0040-6090%2800%2901781-8

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