G. Dennler, A. Houdayer, M. Latrèche, Y. Ségui and Michael R. Wertheimer
Article (2001)
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| Additional Information: | Nom historique du département: Département de génie physique et de génie des matériaux |
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| Department: | Department of Engineering Physics |
| PolyPublie URL: | https://publications.polymtl.ca/27461/ |
| Journal Title: | Thin Solid Films (vol. 382, no. 1-2) |
| Publisher: | Elsevier |
| DOI: | 10.1016/s0040-6090(00)01781-8 |
| Official URL: | https://doi.org/10.1016/s0040-6090%2800%2901781-8 |
| Date Deposited: | 18 Apr 2023 15:21 |
| Last Modified: | 08 Apr 2025 02:16 |
| Cite in APA 7: | Dennler, G., Houdayer, A., Latrèche, M., Ségui, Y., & Wertheimer, M. R. (2001). Studies of the Earliest Stages of Plasma-Enhanced Chemical Vapor Deposition of Sio2 on Polymeric Substrates. Thin Solid Films, 382(1-2), 1-3. https://doi.org/10.1016/s0040-6090%2800%2901781-8 |
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