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New photoresist coating method for high topography surfaces

Kazem Zandi, Ying Zhao, Juan Schneider and Yves-Alain Peter

Paper (2010)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/17412/
Conference Title: 23rd IEEE International Conference on Micro Electro Mechanical Systems (MEMS 2010)
Conference Location: Hong Kong
Conference Date(s): 2010-01-24 - 2010-01-28
Publisher: Institute of Electrical and Electronics Engineers
DOI: 10.1109/memsys.2010.5442482
Official URL: https://doi.org/10.1109/memsys.2010.5442482
Date Deposited: 18 Apr 2023 15:14
Last Modified: 05 Apr 2024 10:59
Cite in APA 7: Zandi, K., Zhao, Y., Schneider, J., & Peter, Y.-A. (2010, January). New photoresist coating method for high topography surfaces [Paper]. 23rd IEEE International Conference on Micro Electro Mechanical Systems (MEMS 2010), Hong Kong. https://doi.org/10.1109/memsys.2010.5442482

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