Kazem Zandi, Ying Zhao, Juan Schneider and Yves-Alain Peter
Paper (2010)
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| Department: | Department of Engineering Physics |
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| ISBN: | 9781424457649 |
| PolyPublie URL: | https://publications.polymtl.ca/17412/ |
| Conference Title: | 23rd IEEE International Conference on Micro Electro Mechanical Systems (MEMS 2010) |
| Conference Location: | Hong Kong |
| Conference Date(s): | 2010-01-24 - 2010-01-28 |
| Publisher: | Institute of Electrical and Electronics Engineers |
| DOI: | 10.1109/memsys.2010.5442482 |
| Official URL: | https://doi.org/10.1109/memsys.2010.5442482 |
| Date Deposited: | 18 Apr 2023 15:14 |
| Last Modified: | 25 Sep 2024 15:55 |
| Cite in APA 7: | Zandi, K., Zhao, Y., Schneider, J., & Peter, Y.-A. (2010, January). New photoresist coating method for high topography surfaces [Paper]. 23rd IEEE International Conference on Micro Electro Mechanical Systems (MEMS 2010), Hong Kong. https://doi.org/10.1109/memsys.2010.5442482 |
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