Documents publiés en "2015"

Mousseau, N., Brommer, P., Joly, J.-F., Béland, L. K., El-Mellouhi, F., N'tsouaglo, G. K., Restrepo, Ó. A., & Trochet, M. (2015). Following atomistic kinetics on experimental timescales with the kinetic Activation-Relaxation Technique. Computational Materials Science, 100, 111-123. Lien externe

Trochet, M., Béland, L. K., Brommer, P., Joly, J.-F., & Mousseau, N. (2015). Diffusion of point defects in crystalline silicon using the kinetic activation-relaxation technique method. Physical Review B, 91(22), 224106 (12 pages). Lien externe