Documents publiés en "2002"

Département de génie physique

Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Sapieha, J.-E., Hatanaka, Y., Aoki, T., & Nakanishi, Y. (2002). Remote Hydrogen Plasma Chemical Vapor Deposition of Silicon- Carbon Thin-Film Materials From a Hexamethyldisilane Source: Characterization of the Process and the Deposits. Journal of Applied Polymer Science, 86(6), 1445-1458. Lien externe