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Meunier, M., Flint, J. H., Haggerty, J. S., & Adler, D. (1987). Laser-induced chemical vapor deposition of hydrogenated amorphous silicon. I. Gas-phase process model. Journal of Applied Physics, 62(7), 2812-2812. Lien externe
Branz, H. M., Meunier, M., Fan, S., Flint, J. H., & Haggerty, J. S. (octobre 1985). Hydrogenated amorphous silicon prepared by laser-induced chemical vapor deposition of silane for solar-cell applications [Communication écrite]. 18th Photovoltaic Specialists Conference, Las Vegas, NV. Lien externe
Allen, S. D., Flint, J. H., Meunier, M., Adler, D., & Haggerty, J. S. (janvier 1984). A-S:H films produced from laser heated gases: Process characteristics and film properties [Communication écrite]. Laser-Assisted Deposition, Etching, and Doping, Los Angeles, Calif.. Lien externe
Meunier, M., Flint, J. H., Adler, D., & Haggerty, J. S. (novembre 1983). A model for the laser-induced chemical vapor deposition of hydrogenated amorphous silicon [Communication écrite]. Laser-Controlled Chemical Processing of Surfaces, MRS Fall Meeting, Boston, Massachusetts. Publié dans MRS Proceedings, 29. Lien externe
