Interfacial Reactions in Epitaxial Al/Tin(111) Model Diffusion Barriers: Formation of an Impervious Self-Limited Wurtzite- Structure Aln(0001) Blocking Layer

J. S. Chun, Patrick Desjardins, C. Lavoie, C. S. Shin, C. Cabral, I. Petrov and J. E. Greene

Article (2001)

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Additional Information:	Nom historique du département: Département de génie physique et de génie des matériaux
Department:	Department of Engineering Physics
Research Center:	GCM - Thin Film Physics and Technology Research Group
PolyPublie URL:	https://publications.polymtl.ca/27504/
Journal Title:	Journal of Applied Physics (vol. 89, no. 12)
Publisher:	American Institute of Physics
DOI:	10.1063/1.1372162
Official URL:	https://doi.org/10.1063/1.1372162
Date Deposited:	18 Apr 2023 15:21
Last Modified:	08 Apr 2025 02:17

Cite in APA 7:	Chun, J. S., Desjardins, P., Lavoie, C., Shin, C. S., Cabral, C., Petrov, I., & Greene, J. E. (2001). Interfacial Reactions in Epitaxial Al/Tin(111) Model Diffusion Barriers: Formation of an Impervious Self-Limited Wurtzite- Structure Aln(0001) Blocking Layer. Journal of Applied Physics, 89(12), 7841-7845. https://doi.org/10.1063/1.1372162
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